Film Thickness Measurement

ALERIS is next generation optical metrology measurement tool. ALERIS incorporates an enhance pattern recognition to accelerate & facilitate recipe generation & setup for multiple chip designs into production. ALERIS integrates advanced optical metrology techniques to handle the full range (150nm to 900nm) of thin film measurement challenges created by new interconnect technologies, increasing device density and advanced gate structures .

The spectraFX 100 system is a production-oriented tool designed to characterize the complex film stacks used in semiconductor mamufauring processes.
The system combines a small-spot, broadband UV spectroscopic ellipsometer and a UV spectrophotometer in a single system.

The ASET-F5x thin film measurement system combines powerful spectroscopic ellipsometry (SE) technology and broadband ultraviolet (UV) spectrophotometry. The system provides sensitive, non-destructive, optical thickness and film qualityn measurements of bulk samples, single-layer thin films, and multi-layer thin film stacks.

The UV-1250SE system is the first production tool to use small-spot spectroscopicellipsometry in a production fab.  Fast, robust measurements are assured by thesimultaneous collection  of Ellipsometry variables at all wavelengths, compared with  the wavelength-by-wavelength

Based on proprietary reßective optics, the UV-1050 system’s broadband UV spectrophotometry technology provides measurements on The widest range of applications, including oxide on polysilicon, ultraviolet (UV) reflectivity, etch-to-clear, and simultaneous oxide.

The ATLAS system is a production-oriented tool designed to  characterize the complex film stacks used  in semiconductor  mamufauring processes

The ATLAS XP+ system is a production-oriented tool designed to  characterize the complex film stacks used  in semiconductor  mamufauring processes